Design Features

• 5kV to 30kV Operation
  
• Sub micron spot size
  
• 2 Degree bend for neutral suppression
  
• Differential pumping for reduced main chamber pressure
  
• Inert gas and Nitrogen ion capability. Oxygen with optional Thoria coated filaments.
  
• Optional source oven for generation of ion species from solid phase materials
  
• Optional blanking and beam bunching optics
  
• Optional variable aperture
  
• Controller and Raster generator in a single 10-1/2" high 19" rack mount cabinet
  
• Control of all ion gun parameters via USB interface