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Phone: 541-312-2410
Fax: 541-312-2412
Fax: 541-312-2412
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Model 1401
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Model LEIG 2
Ion Gun Controllers
Electron Emitters
In-House Capabilities
About nti
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The Nonsequitur Technologies Model
LEIG-2 Ion Gun features high beam currents at very low beam energies. It
also may be operated at high beam energies (up to 2keV) to provide additional
depth profiling and sample cleaning capability. Likely applications would
include charge compensation, ion scattering, and studies of ion/solid interactions.
Ion generation is by means of electron impact ionization with dual filaments for long source life without having to break system .vacuum The filaments are located off axis to prevent line of sight deposition of the filament material onto the sample.
Design Features
Ion generation is by means of electron impact ionization with dual filaments for long source life without having to break system .vacuum The filaments are located off axis to prevent line of sight deposition of the filament material onto the sample.
Design Features
- Unique ion source for stable emission
- Dual Tungsten alloy filaments
- Power supply and deflection supply in a single 5-1/4 19" rack mount
- UHV Construction
- Electrical connections and gas inlet all rear of housing for simplified installation.
| Beam Energy |
5eV to 2000eV continuously variable |
|
| Beam Current |
5µA maximum @ 2000V beam energy |
|
| Spot Size (FWHM) |
1.5mm @ 1µA, 20eV; 1.0mm @ 2µA,
40eV; 0.2 mm @ 3µA, 1kV, 20 mm W.D |
|
| Electrical |
115/220V 50/60 Hz Autoselect |
|
| Flanges |
2.75 in (70 mm) CF for mounting, 1.33 in (34 mm) CFF gas inlet |