Design Features

• Duoplasmatron level performance from an  electron impact source
  
• Adjustable spot size ≥ 15µm for spatially defined sputtering
  
• Emission regulated bombardment provides stable ion current with front panel adjustable dynamic range x300
  
• Continuously variable beam energy up to 5keV
  
• Dual octupole for beam scanning and astigmatism correction
  
• Pre-objective lens deflection for reduced spot size
  
• Integral beam current monitoring capability
  
• No direct filament to sample line of sight to avoid unwanted sample contamination
  
• Replaceable beam trimming aperture with typical life-time of > 500 hours
  
• Dual filaments provide operational backup with typical filament life-time > 500 hours
  
• Internal source pressure sensor permits monitoring of ion source pressure
  
• All UHV compatible and etch resistant materials used in fabrication
  
• Differential pumping to minimize main chamber gas loading
  
• Operates over the range of inert gas species